WTi10 WTi20 high pure tungsten Titanium Target

FOB Price

USD $100 - $1000 / Piece

1 Piece(Min.Order)

Port chagnsha,shanghai
Payment TermsT/T PayPal
Delivery Detail30 days

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Product Details

Brand Name	4N-5N	Shape	round
Application	High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.	Chemical Composition	99.99%-99.995%
Dimensions	Diameter 150～350 Thickness 6～25	Material	WTi

Product Description

Application:

High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.

Specification:

Name	Molecular formula	Specification	Size		Relative density	Grain size	Defect rate
Tungsten target	W	4N（99.99%）	Inch	mm	≥99%	≯50µm	0
		5N（99.999%）	D（6,8,10,12） H（0.25,0.5,0.75）	Diameter 150～350 Thickness 6～25
Tungsten Titanium Target	WTi10 WTi20	4N（99.99%）			≥99%	≯50µm	0
		4N5（99.995%）

Contact Us

Ultra Minor Metal Ltd: Contact nameApple
Chat Now; Phone86-731-88590095; AddressRm.101,Bldg.10, Xinggong Science and Technology Park, No.100 Luyun Rd.,Changsha High-tech Industrial Development Zone,, Changsha, Hunan